NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

One Page Summary

Instruction: Click on selected Tab for more information.

Element:

Formula:

HC(O)OH/MgO/Mg

XPS Formula:

carbon atoms in formate species

Name:

formic acid/magnesium oxide/magnesium

CAS Registry No:

64-18-6

Class:

carboxylic acid, organic acid, organometallic

Author Name(s):

Peng X.D., Barteau M.A.

Journal:

Surf. Sci. 224, 327

DOI:

Pub Year:

1989

book All Records in this Publication

Photoelectron Line

290.40

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Other, Mg2p3=49.79

Charge Reference:

Element

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Adsorption of HCOOH onto MgO thin films which were formed on the Mg(0001) single crystal (99.999 % purity) surface by a ~100 L exposure to O2.

Specimen:

adsorbed, multilayer structure, oxidizing atmosphere, oxygen pressure

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

150