NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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Si

SiH₀.₄₇

silicon hydride (SiH0.47)

CAS Registry No:

alloy, hydride

Author Name(s):

Das S.R., Webb J.B., de Castro S.C., Sundaram V.S.

J. Appl. Phys. 60, 2530

Pub Year:

1986

book All Records in this Publication

Photoelectron Line

Line Designation:

2p_3/2

Binding Energy (eV):

99.00

Energy Uncertainty:

0.1

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

No

Anode Material:

Al

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au4f7 = 84.00

Charge Reference:

Adventitious carbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

The samples were prepared by planar rf reactive magnetron sputtering at substrate temperature of 300 K. The sample has not discernible microstructural features down to the 20 A level and with a smooth uniform density.

amorphous, reacted film, semiconductor, sputter deposited

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300

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