NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

One Page Summary

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Element:

Formula:

SiO₀.₃₅N₁.₁/Si

XPS Formula:

SiO₀.₃₅N₁.₁/Si

Name:

silicon oxynitride (SiO0.35N1.1/Si)/silicon

CAS Registry No:

Class:

nitride

Author Name(s):

Finster J., Klinkenberg E.-D., Heeg J.

Journal:

Vacuum 41, 1586

DOI:

Pub Year:

1990

book All Records in this Publication

Photoelectron Line

532.30

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Adventitious carbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

30 nm SiO0.35N1.1/Si(100). Low pressure CVD.

Specimen:

chemical vapor deposition, insulator, thin film

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300