NIST X-ray Photoelectron Spectroscopy Database

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(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OH/Si

(^-O)₃Si(CH₂)₃NHC*(O)(CH₂)₇C*(O)OH/Si

9-oxo-9-(propylamino)nonanoic acid covalently bonded to oxidized silicon

7440-21-3

amide, nitrogen, organic acid, organometallic, oxygen

Kallury K.M.R., Debono R.F., Krull U.J., Thompson M.

J. Adhesion Sci. Technol. 5, 801

Pub Year:

1991

Photoelectron Line

288.00

other

Gaussian

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

The thickness of the film determined by ellipsometry is 31+-4 A. The relative intensity was 0.154. The spectra were recorded at normal emission.