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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
5 A Tm/p-Si(111). The Si wafer was cleaned by Ar+ ion bombardment and subsequently annealed (T = 1100 K). The total FWHM is 1.3 eV. The intensity ratio of the Gaussian/Lorentzian components was 80/20. The thickness was measured using a quartz-crystal thi