Detail summary:
General Citation Data Processing Measurement Information Specimen Information Comment

General:
Element: O
Formula: SiO2
XPS Formula:
Name: silicon dioxide
CAS Registry No: 7631-86-9
Classes: catalyst, glass, IV semiconductor, mineral, oxide
Citation:
Author Name(s): Sprenger D., Bach H., Meisel W., Gutlich P.
Journal: J. Non-cryst. Solids 126, 111 (1990)
Data Processing:
Data Type: Photoelectron Line
Line Designation: 1s
Quality of Data: Adequate
Binding Energy (eV) 532.1
Energy Uncertainty:
Background Subtraction Method: Shirley
Peak Location Method: mixed Gaussian/Lorentzian
Full Width at Half-maximum Intensity (eV): 1.25
Gaussian Width (eV):
Lorentzian Width (eV):
Measurement Information:
Use of X-ray Monochromator: No
Excitation Energy: Mg
X-ray Energy:
Overal Energy Resolution (eV):
Calibration: Au4f7 = 84.00
Charge Reference: Adventitious carbon
Energy Scale Evalution: Reliable, with one-point correction of energy scale
Specimen Information:
Specimen: crushed, insulator
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K): 300
Sample Quality: Adequate
Comment:
Notes: Herasil, pure quartz glass. The sample was broken under UHV. The intensity ratio of the Gaussian/Lorentzian components was 0.99. The total FWHM is 1.25.

General Citation Data Processing Measurement Information Specimen Information Comment

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