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Detail summary:
General
Citation
Data Processing
Measurement Information
Specimen Information
Comment
General
:
Element
:
O
Formula
:
SiO2
XPS Formula
:
Name
:
silicon dioxide
CAS Registry No
:
7631-86-9
Classes
:
catalyst, glass, IV semiconductor, mineral, oxide
Citation
:
Author Name(s)
:
Stoch A., Stoch J., Rakowska A.
Journal
:
Surf. Interface Anal. 22, 242 (1994)
Data Processing
:
Data Type
:
Photoelectron Line
Line Designation
:
1s
Quality of Data
:
Adequate
Binding Energy (eV)
533.0
Energy Uncertainty
:
Background Subtraction Method
:
Peak Location Method
:
Full Width at Half-maximum Intensity (eV)
:
Gaussian Width (eV)
:
Lorentzian Width (eV)
:
Measurement Information
:
Use of X-ray Monochromator
:
No
Excitation Energy
:
Al
X-ray Energy
:
Overal Energy Resolution (eV)
:
Calibration
:
Charge Reference
:
Adventitious carbon
Energy Scale Evalution
:
Reliable (reported energy within 300 eV of a reference energy)
Specimen Information
:
Specimen
:
insulator, thick film
Method of Determining Specimen Composition
:
X-ray Photoelectron Spectroscopy
Method of Determining Specimen Crystallinity
:
Specimen Temperature (K)
:
300
Sample Quality
:
Good
Comment
:
Notes
:
Silica coating was deposited from standard solution prepared by mixing tetraethoxysilane and alcohol with HNO3 acid as catalyst.
General
Citation
Data Processing
Measurement Information
Specimen Information
Comment
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