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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
n-type S-doped and p-type Cd-doped InP(100)-(4x2) wafers with a carrier concentration of 1E18 cm-3. The surface was cleaned by hydrofluoric acid ad subsequent cycles of Ne+ ion bombardment (Ep = 550 eV, j = 0.7 microampere cm-2) and annealing (T = 650 K, time = 5 min).The spectra were recorded at normal emission.