There was a problem with the connection!

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:


Tab Page Summary

General:
XeF2/Si
bulk state
xenon difluoride/silicon
element, fluoride

Citation:
Simpson W.C., Yarmoff J.A., Hung W.H., McFeely F.R.
Surf. Sci. 355, L283
Pub Year:
1996

Data Processing:
Chemical Shift
mixed Gaussian/Lorentzian

Measurement:
Anode Material:
other source
X-ray Energy:
170
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
Element
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
40 L XeF2/Si(111)-(7x7). The surface was lightly annealed to remove higher fluorides and then exposed to 400 L XeF2. Branching ratio = 0.50.

Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300

An error has occurred. This application may no longer respond until reloaded. Reload 🗙