NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

XeF₂/Si

bulk state

xenon difluoride/silicon

CAS Registry No:

7440-21-3

Class:

element, fluoride

Citation:

Author Name(s):

Simpson W.C., Yarmoff J.A., Hung W.H., McFeely F.R.

Journal:

Surf. Sci. 355, L283

DOI:

Pub Year:

1996

bookAll Records in this Publication

Data Processing:

Chemical Shift

CS-2p_3/2

0.00

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

0.46

Gaussian Width (eV):

Lorentzian Width (eV):

0.080

Measurement:

Use of X-ray Monochromator:

Anode Material:

other source

X-ray Energy:

170

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Element

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

40 L XeF2/Si(111)-(7x7). The surface was lightly annealed to remove higher fluorides and then exposed to 400 L XeF2. Branching ratio = 0.50.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300