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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
C
Formula:
(-CH2C(CH3)(C(O)OCH3)-)n
XPS Formula:
(-C(CH3)(C*(O)-O-CH3)-CH2-)n
Name:
poly(methyl methacrylate)
CAS Registry No:
9011-14-7
Class:
ester, oxygen, polymer, sulfur

Citation:
Author Name(s):
Lhoest J.-B., Bertrand P., Weng L.T., Dewez J.-L.
Journal:
Macromolecules 28, 4631
DOI:
Pub Year:
1995
bookAll Records in this Publication

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
1s
Binding Energy (eV)
288.90
Energy Uncertainty:
Background Subtraction Method:
Shirley
Peak Location Method:
mixed Gaussian/Lorentzian
Full Width at Half-maximum Intensity (eV):
1.18
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
Yes
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
Internal hydrocarbon
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
The C/O composition ratio determined by XPS was 2.46. The relative intensity is 0.198. FAT mode. An electron flood gun gun (Ep = 6 or 10 eV) and a Ni mesh were used for charge compensation. The intensity ratio of the Gaussian/Lorentzian components was 85/15.

Specimen:
Specimen:
Method of Determining Specimen Composition:
X-ray Photoelectron Spectroscopy
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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