NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

(^-C₆H₄C(CH₃)₂C₆H₄OC₆H₄S(O)₂C₆H₄O^-)n

XPS Formula:

(^-O^-C₆H₄^-S*(O₂)^-C₆H₄^-O^-C₆H₄^-C((CH₃)₂)^-C₆H₄^-)n

Name:

poly(sulfone)

CAS Registry No:

25135-51-7

Class:

ether, oxygen, phenyl benzene, polymer, sulfonyl, sulfur

Citation:

Author Name(s):

Kaul A.

Journal:

Polymer Preprints 28, 229

Pub Year:

1987

bookAll Records in this Publication

Data Processing:

Photoelectron Line

2p_3/2

164.15

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

2.2

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300