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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
Si
Formula:
(CH3)3SiOSi(CH3)3
XPS Formula:
(CH3)3Si*OSi(CH3)3
Name:
hexamethyldisiloxane
CAS Registry No:
107-46-0
Class:
organometallic

Citation:
Author Name(s):
Kusabiraki M., Ando K.
Journal:
Kobunshi Ronbunshi 45, 309
Pub Year:
1988

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
2p3/2
Binding Energy (eV)
101.40
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
2.6
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Au4f7 = 84.00
Charge Reference:
Internal hydrocarbon
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
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