NIST X-ray Photoelectron Spectroscopy Database

The XPS web application is currently unavailable due to a system issue affecting communication between the web server and the database.

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

(^-(CH₂)₄O^-)n

XPS Formula:

(^-C*H₂CH₂CH₂C*H₂O^-)n

Name:

poly(tetramethylene glycol)

CAS Registry No:

25190-06-1

Class:

alcohol, ether, oxygen, polymer

Citation:

Author Name(s):

Beamson G., Briggs D.

Journal:

High Resolution XPS of Organic Polymers: the Scienta ESCA300 Database

DOI:

Pub Year:

1993

bookAll Records in this Publication

Data Processing:

Photoelectron Line

286.35

Background Subtraction Method:

Peak Location Method:

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Energy Scale Evaluation:

Comment:

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):