NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Ni

NiSi

nickel silicon imc

CAS Registry No:

intermetallic, silicide

Citation:

Author Name(s):

Cheung N.W., Grunthaner P.J., Grunthaner F.J., Mayer J.W., Ullrich B.M.

J. Vac. Sci. Technol. 18, 917

Pub Year:

1981

keyboard_arrow_downbookAll Records in this Publication

Instruction:

Click the column to sort in ascending or descending order.
Enter a string in the input box in the column header and press the enter to filter the search result in the selected column.
Click on the hyperlink in the column for more information.

Total Records: 3

Data Processing:

Photoelectron Line

Line Designation:

2p_3/2

Binding Energy (eV)

853.50

Energy Uncertainty:

Background Subtraction Method:

Peak Location Method:

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

No

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Ni2p3=852.4

Charge Reference:

Conductor

Energy Scale Evaluation:

Comment:

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

An error has occurred. This application may no longer respond until reloaded. Reload 🗙