NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

[Rh₂(HCOO)₄(NH₂C₆H₄COOH)₂]

Name:

bis(aminobenzoicacid-N)tetrakis(mu-(formato-O,O'))dirhodium

CAS Registry No:

53122353

Class:

acid, amine, carboxylic acid, formato ligand, nitrogen, organic acid, organometallic, oxygen, phenyl benzene

Citation:

Author Name(s):

Nefedov V.I., Salyn Y.V., Majorova A.G., Nazarova L.A., Baranovski I.B.

Journal:

Zh. Neorg. Khimii 19, 1353

Pub Year:

1974

bookAll Records in this Publication

Data Processing:

Photoelectron Line

3d_5/2

309.40

Background Subtraction Method:

Peak Location Method:

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with two-point correction of energy scale

Comment:

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):