NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Si

TaSi₂

tantalum disilicide

CAS Registry No:

12039-79-1

IV-VI semiconductor, silicide

Citation:

Author Name(s):

Riviere J.C., Crossley J.A.A.

Surf. Interface Anal. 8, 173

Pub Year:

1986

bookAll Records in this Publication

Data Processing:

Auger Parameter

Line Designation:

AP-2s, KL₂₃L₂₃(¹D)

Auger Parameter (eV)

1767.70

Energy Uncertainty:

Background Subtraction Method:

Peak Location Method:

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

No

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au

Charge Reference:

Energy Scale Evaluation:

Comment:

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

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