NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

SiOx/Si

SiO₂/Si*

silicon oxides/silicon (CasNo:7440-21-3)

CAS Registry No:

7440-21-3

Class:

anhydride, element, IV-VI semiconductor, non-stoichiometric oxide, oxide

Citation:

Author Name(s):

Contour J.P., Massies J., d'Avitaya F.A.

Journal:

J. Vac. Sci. Technol. B 5, 908

DOI:

Pub Year:

1987

bookAll Records in this Publication

Data Processing:

Photoelectron Line

99.30

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Au4f7 = 84.00

Charge Reference:

Adventitious carbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

LEED 2x1 pattern.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Low-energy Electron Diffraction

Specimen Temperature (K):

300