NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

CH₃SC₆H₄O(CH₂)₁₁SiCl₃/Si

XPS Formula:

CH₃SC₆H₄O(CH₂)₁₁SiCl₃/Si

Name:

11-[4-(methylthio)phenoxy]-1-(trichlorosilyl) undecane/silicon

CAS Registry No:

Class:

ether, organometallic, oxygen, phenyl benzene, sulfur

Citation:

Author Name(s):

Tillman N., Ulman A., Elman J.F.

Journal:

Langmuir 5, 1020

DOI:

Pub Year:

1989

bookAll Records in this Publication

Data Processing:

Photoelectron Line

2p_1/2

164.64

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Yes

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Self-assembled monolayer film.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300