NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

(CH₃)₃Al/(^-CH₂C(OH)H^-)n

XPS Formula:

(CH₃)₃Al/(^-CH₂C*(OH)H^-)n

Name:

trimethylaluminum/poly(vinyl alcohol)

CAS Registry No:

9002-89-5

Class:

alcohol, organometallic, oxygen, polymer

Citation:

Author Name(s):

Akhter S., Zhou X.-L., White J.M.

Journal:

Appl. Surf. Sci. 37, 201

DOI:

Pub Year:

1989

bookAll Records in this Publication

Data Processing:

Photoelectron Line

286.30

Background Subtraction Method:

Peak Location Method:

Gaussian

Full Width at Half-maximum Intensity (eV):

1.33

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

8E4 L trimetyl aluminium were deposited onto poly(vinyl alcohol) thin film. The polymer film (~1000 A) was solution cast on a Ta foil.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300