NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

(^-C₆H₄S(O)₂C₆H₄O^-)n

XPS Formula:

(^-C₆H₄S*(O)₂C₆H₄O^-)n

Name:

poly(oxy-1,4-phenylenesulfonyl-1,4-phenylene)

CAS Registry No:

25667-42-9

Class:

ether, oxygen, phenyl benzene, polymer, sulfonyl, sulfur

Citation:

Author Name(s):

Gardella J.A., Jr, Ferguson S.A., Chin R.L.

Journal:

Appl. Spectrosc. 40, 224

DOI:

Pub Year:

1986

book All Records in this Publication

Data Processing:

Photoelectron Line

167.80

Background Subtraction Method:

other

Peak Location Method:

Gaussian

Full Width at Half-maximum Intensity (eV):

2.2

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

The films were thick enough so that no peaks were observed from substrate metal.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

293