NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

SiOx/Si

Si*Ox/Si

silicon oxides/silicon

CAS Registry No:

11126-22-0

Class:

anhydride, element, IV-VI semiconductor, non-stoichiometric oxide, oxide

Citation:

Author Name(s):

Hoflund G.B., Asbury D.A., Corallo C.F., Corallo G.R.

Journal:

J. Vac. Sci. Technol. A 6, 70

DOI:

Pub Year:

1988

bookAll Records in this Publication

Data Processing:

Chemical Shift

CS-2p

4.25

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Element

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Native oxide layer on a Si(111) surface.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

293