NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

(^-CH₂C(CH₃)(C(O)OC₄H₉)^-)n

XPS Formula:

(^-CH₂C(CH₃)(C(O*)OCH₂CH₂CH₂CH₃)^-)n

Name:

poly(butyl methacrylate)

CAS Registry No:

9003-63-8

Class:

ester, polymer

Citation:

Author Name(s):

Castner D.G., Ratner B.D.

Journal:

Surf. Interface Anal. 15, 479

DOI:

Pub Year:

1990

bookAll Records in this Publication

Data Processing:

Photoelectron Line

531.80

Background Subtraction Method:

other

Peak Location Method:

Gaussian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Yes

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

293