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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
C
Formula:
(-CH2C(CH3)(C(O)OCH3)-)n
XPS Formula:
(-C*H2C*(C*H3)(C(O)OCH3)-)n
Name:
poly(methyl methacrylate)
CAS Registry No:
9011-14-7
Class:
ester, oxygen, polymer, sulfur

Citation:
Author Name(s):
Buchwalter L.P., Czornyj G.
Journal:
J. Vac. Sci. Technol. A 8, 781
DOI:
Pub Year:
1990

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
1s
Binding Energy (eV)
284.80
Energy Uncertainty:
Background Subtraction Method:
other
Peak Location Method:
Gaussian
Full Width at Half-maximum Intensity (eV):
1.8
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
Yes
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Au4f7 = 84.00
Charge Reference:
Internal hydrocarbon
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
The film was baked in a vacuum oven (T = 348 K, time = 30 min) to remove solvent The C/O intensity ratio was 2.51. The relative intensity of this carbon state was 0.62. An electron flood gun (Ep = 2 eV, Ip = 0.5 microamps) was used for charge compensation

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
293
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