NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

NO/Si

Name:

nitrogen oxide/silicon

CAS Registry No:

7440-21-3

Class:

element, IV semiconductor, nitride, non-stoichiometric oxide, oxide

Citation:

Author Name(s):

Glachant A., Soukiassian P., Mangat P.S., Peng J., Kim S.T.

Journal:

Appl. Surf. Sci. 56, 802

DOI:

Pub Year:

1992

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Data Processing:

Data Type:

Doublet Separation for Photoelectron Lines

Line Designation:

DS-2p

Double Separation (eV)

0.62

Energy Uncertainty:

Background Subtraction Method:

other

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Yes

Anode Material:

other source

X-ray Energy:

130

Overall Energy Resolution (eV):

0.4

Calibration:

Si2p=99.34

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

1E3 L NO/Si.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300