NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

TiN

titanium nitride

25583-20-4

nitride

Citation:

Author Name(s):

Saha N.C., Tompkins H.G.

Journal:

J. Appl. Phys. 72, 3072

DOI:

Pub Year:

1992

book All Records in this Publication

Data Processing:

Photoelectron Line

2p_3/2

455.50

0.2

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Adventitious carbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

3500 A TiN/Si(100). Reactive sputter deposition using Ar/N2 mixture. The as-deposited film was cleaned by Ar+ ion bombardment.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300