NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

(^-O)₃Si(CH₂)₃NHC(O)(CH₂)₇C(O)OH/Si

XPS Formula:

hydrogen^-bonded nitrogen atoms

Name:

9-oxo-9-(propylamino)nonanoic acid covalently bonded to oxidized silicon

CAS Registry No:

7440-21-3

Class:

amide, nitrogen, organic acid, organometallic, oxygen

Citation:

Author Name(s):

Kallury K.M.R., Debono R.F., Krull U.J., Thompson M.

Journal:

J. Adhesion Sci. Technol. 5, 801

DOI:

Pub Year:

1991

bookAll Records in this Publication

Data Processing:

Photoelectron Line

401.60

Background Subtraction Method:

other

Peak Location Method:

Gaussian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

The thickness of the film determined by ellipsometry is 31+-4 A. The relative intensity was 0.12. The spectra were recorded at normal emission.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300