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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:


Tab Page Summary

General:
TiN/Ti
Ti*N/Ti
titanium nitride/titanium
25583-20-4
nitride

Citation:
Siemensmeyer B., Bade K., Schultze J.W.
Ber. Bunsenges. Phys. Chem. 95, 1461
Pub Year:
1991

Data Processing:
Photoelectron Line
mixed Gaussian/Lorentzian

Measurement:
Anode Material:
Al
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Au,Ag,Cu = 84.00,368.27,932.67
Charge Reference:
Conductor
Energy Scale Evaluation:
Calibration study
Comment:
The TiN layers with a thickness of about 80 A were prepared by implantation of 3 keV N2+ into polycrystalline Ti. The N+ ion dose was about 3E17 cm-2. FAT mode. The total FWHM is 2.0 eV.

Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300

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