NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

(^-CH₂C(CH₃)(C(O)OH)^-)n

XPS Formula:

(^-CH₂C(CH₃)(C*(O)OH)^-)n

Name:

poly(methacrylic acid)

CAS Registry No:

25087-26-7

Class:

acid, carboxylic acid, organic acid, oxygen, polymer

Citation:

Author Name(s):

Briggs D., Beamson G.

Journal:

Anal. Chem. 64, 1729

DOI:

Pub Year:

1992

book All Records in this Publication

Data Processing:

Photoelectron Line

289.13

0.15

Background Subtraction Method:

Linear

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Yes

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Ag3d5 = 368.27

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

An electron flood gun (Ep = ~1 eV, Ip = 2.3 A) was used for charge compensation.

Specimen:

Method of Determining Specimen Composition:

X-ray Photoelectron Spectroscopy

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300