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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
S
Formula:
C6H5SH/Ni
XPS Formula:
atomic sulfur
Name:
benzenethiol/nickel
CAS Registry No:
108-98-5
Class:
carbide, element, phenyl benzene, sulfur, thiol

Citation:
Author Name(s):
Huntley D.R.
Journal:
J. Phys. Chem. 96, 4550
DOI:
Pub Year:
1992

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
2p
Binding Energy (eV)
161.90
Energy Uncertainty:
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Other, Ni3p3/2 = 66.08
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
0.45 ML (sulfur coverage) C6H5SH was adsorbed onto Ni(110) at 100 K and annealed to 300 - 800 K.The substrate was cleaned by Ne+ ion bombardment and subsequently annealed (T = 1000 K, time = 60 s).

Specimen:
Specimen:
Method of Determining Specimen Composition:
Auger Electron Spectroscopy
Method of Determining Specimen Crystallinity:
Low-energy Electron Diffraction
Specimen Temperature (K):
300
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