NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Si

Mo₃Si

trimolybdenum silicide

CAS Registry No:

silicide

Citation:

Author Name(s):

Johansson L.I., Hakansson K.L., Wincott P.L., Karlsson U.O., Christensen A.N.

Phys. Rev. B 43, 12355

Pub Year:

1991

bookAll Records in this Publication

Data Processing:

Surface Core-level Shift for the Second Layer of Atoms

Line Designation:

SS2-2p

Surface Core-Level Shift (eV) for the second Layer of Atoms

-1.03

Energy Uncertainty:

0.04

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

0.25

Lorentzian Width (eV):

0.10

Measurement:

Use of X-ray Monochromator:

Yes

Anode Material:

other source

X-ray Energy:

117

Overall Energy Resolution (eV):

0.2

Calibration:

Charge Reference:

Element

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

Mo3Si(100)-(1x1).The sample was cleaned by Ar+ ion bombardment (Ep = 600 eV, Ip = 1 microampere, time = 5 min) followed by repeated annealings (T = ~1173 K). Branching ratio = 0.50. The spectra were recorded at normal emission. Asymmetry parameter = 0.12. Asymmetry parameter of the bulk component = 0.00.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Low-energy Electron Diffraction

Specimen Temperature (K):

300

An error has occurred. This application may no longer respond until reloaded. Reload 🗙