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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:


Tab Page Summary

General:
MoSi2
molybdenum disilicide
12136-78-6
IV-VI semiconductor, silicide

Citation:
Johansson H.I.P., Hakansson K.L., Johansson L.I., Christensen A.N.
Phys. Rev. B 49, 7484
Pub Year:
1994

Data Processing:
Surface Core-level Shift for the Second Layer of Atoms
mixed Gaussian/Lorentzian

Measurement:
Anode Material:
other source
X-ray Energy:
110, 140
Overall Energy Resolution (eV):
0.23
Calibration:
FL = Fermi level
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
MoSi2(110)-(1x1). The single-crystal was grown in a floating-zone growth mode in a He atmosphere with a pressure of 1 MPa. The crystal was cleaned by ion bombardment (time = 10 min) and subsequently annealed (T = 1173 K). Branching ratio = 0.5. Asymmetry parameter = 0.03.

Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Low-energy Electron Diffraction, X-ray Diffraction
Specimen Temperature (K):
300

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