NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

SiO₂/Si

Name:

silicon dioxide/silicon

CAS Registry No:

7631-86-9

Class:

element, IV semiconductor, non-stoichiometric oxide, oxide

Citation:

Author Name(s):

Koshino K., Matsuo J., Nakamura M.

Journal:

Jpn. J. Appl. Phys. Part 1 32, 3063

DOI:

Pub Year:

1993

bookAll Records in this Publication

Data Processing:

Photoelectron Line

103.70

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Other, Si2p = 99.34

Charge Reference:

Element

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

50 A SiO2/Si.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300