There was a problem with the connection!

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:


Tab Page Summary

General:
Si/NH3
silicon atoms attached to H
silicon/ammonia
element, hydride, nitride

Citation:
Dufour G., Rochet F., Roulet H., Sirotti F.
Surf. Sci. 304, 33
Pub Year:
1994

Data Processing:
Chemical Shift
mixed Gaussian/Lorentzian

Measurement:
Anode Material:
other source
X-ray Energy:
135
Overall Energy Resolution (eV):
0.3
Calibration:
FL = Fermi level
Charge Reference:
Element
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
60 L NH3 were adsorbed onto Si(001)-(2x1) at 90 K. The Si wafer was cleaned by heating at 1323 K for 15 s. The relative intensity was 0.170. Branching ratio = 0.5.

Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Low-energy Electron Diffraction
Specimen Temperature (K):
90

An error has occurred. This application may no longer respond until reloaded. Reload 🗙