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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Reliable (reported energy within 300 eV of a reference energy)
Comment:
The film with thickness of about 600 A was prepared in high vacuum (1E-5 Pa) by thermal evaporation of SiO grains onto clean glass substrate kept at 300 K, and thermal annealing.