NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Si

SiO₂.₀₅

silicon oxide (SiO2.05)

CAS Registry No:

non-stoichiometric oxide

Citation:

Author Name(s):

Alfonsetti R., De Simone G., Lozzi L., Passacandanto M., Picozzi P., and Santucci S.

Surf. Interface Anal. 22, 89

Pub Year:

1994

book All Records in this Publication

Data Processing:

Photoelectron Line

Line Designation:

2p

Binding Energy (eV)

103.70

Energy Uncertainty:

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

No

Anode Material:

Al

X-ray Energy:

Overall Energy Resolution (eV):

1.5

Calibration:

Charge Reference:

Adventitious carbon

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

The film with thickness of about 600 A was prepared in high vacuum (1E-5 Pa) by thermal evaporation of SiO grains onto clean glass substrate kept at 300 K, and thermal annealing.

Specimen:

Method of Determining Specimen Composition:

X-ray Photoelectron Spectroscopy

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300

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