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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
B
Formula:
B/TaB1.94/Ta
XPS Formula:
metal state
Name:
boron/tantalum diboride/tantalum
CAS Registry No:
7440-42-8
Class:
element

Citation:
Author Name(s):
Wang Y., Fan J., Trenary M.
Journal:
Chem. Mater. 5, 192
DOI:
Pub Year:
1993

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
1s
Binding Energy (eV)
187.90
Energy Uncertainty:
Background Subtraction Method:
Linear
Peak Location Method:
Gaussian
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Ag3d5 = 368.27
Charge Reference:
Ag
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
B/TaB1.94/Ta(110). The boron thin film was grown at 650 -700 K and annealed to 1000 K. The B2H6/Ar mixture was used. TaB2 was prepared by thermal decomposition of B2H6. FAT mode. The substrate was cleaned by cycles of Ar+ ion bombardment (Ep = 2 keV, Ip = 8 - 10 microamperes) and annealing (T = 2700 K). FAT mode.

Specimen:
Specimen:
Method of Determining Specimen Composition:
X-ray Photoelectron Spectroscopy
Method of Determining Specimen Crystallinity:
X-ray Diffraction
Specimen Temperature (K):
300
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