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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:
Summary Page
Tab Page Summary

General:
Element:
S
Formula:
Cu/(-C4HS((CH2)5CH3)-)n
XPS Formula:
sulfur atoms reacted with Cu
Name:
copper/poly(3-hexylthiophene)
CAS Registry No:
104934-50-1
Class:
organometallic, other ring, polymer, sulfur, thiol

Citation:
Author Name(s):
Lachkar A., Selmani A., Sacher E., Leclerc M., Mokhliss R.
Journal:
Synthetic Metals 66, 209
DOI:
Pub Year:
1994

Data Processing:
Data Type:
Photoelectron Line
Line Designation:
2p1/2
Binding Energy (eV)
161.75
Energy Uncertainty:
Background Subtraction Method:
Shirley
Peak Location Method:
Gaussian
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):

Measurement:
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Charge Reference:
Internal hydrocarbon
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
18 A Cu/(-C4HS((CH2)5CH3)-)n.The C/S composition ratio determined by XPS was 10. Branching ratio = 0.5. FAT mode. The thickness was measured using a quartz-crystal thickness monitor.

Specimen:
Specimen:
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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