NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

S

CH₃SH/W

atomic sulfur

methanethiol/tungsten

CAS Registry No:

74-93-1

element, thiol

Citation:

Author Name(s):

Mullins D.R., Lyman P.F.

J. Phys. Chem. 97, 9226

Pub Year:

1993

book All Records in this Publication

Data Processing:

Photoelectron Line

Line Designation:

2p_3/2

Binding Energy (eV)

162.95

Energy Uncertainty:

0.04

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

No

Anode Material:

other source

X-ray Energy:

208

Overall Energy Resolution (eV):

0.50

Calibration:

Cu3p, L3MM, 2p3 = 75.14, 334.95, 932.67

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

CH3SH was adsorbed onto W(001) at 100 K and annealed to 350 K. Sulfur coverage is 0.24. The substrate was cleaned by O2 treatment (p = 5E-8 Torr) and heating (T = 1000 - 2300 K).

Specimen:

Method of Determining Specimen Composition:

Auger Electron Spectroscopy

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

100

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