NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

Tab Page Summary

General:

Element:

Formula:

(^-CH₂CH(C(O)OH)^-)n

XPS Formula:

(^-CH₂CH(C(O)O*H)^-)n

Name:

poly(acrylic acid)

CAS Registry No:

9003-01-4

Class:

acid, alcohol, carboxylic acid, hydroxyl(organic), organic acid, oxygen, polymer

Citation:

Author Name(s):

Endo K., Inoue C., Kobayashi N., Aida M.

Journal:

J. Phys. Chem. Solids 55, 471

DOI:

Pub Year:

1994

bookAll Records in this Publication

Data Processing:

Photoelectron Line

534.00

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Measurement:

Use of X-ray Monochromator:

Yes

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

FAT mode. An electron flood gun was used for charge compensation. The relative intensity is 0.99. The total FWHM is 2.04 eV.

Specimen:

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300