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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
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General:
Citation
Data Processing:
Measurement:
Specimen:
Element:
Ge
Formula:
Ge
Name:
germanium
CAS Registry No:
7440-56-4
Class:
element, II-VI semiconductor, IV semiconductor, IV-VI semiconductor
Author Name(s):
Dhanak V.R., Goldoni A., Sancrotti M., Modesti S., Santoni A.
Journal:
J. Electron Spectrosc. Relat. Phenom. 80, 45
DOI:
10.1016/0368-2048(96)02919-2
Pub Year:
1996
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Total Records:
4
Element
Atomic No
Formula
Spectral Line
Energy (eV)
Details
Ge
32
Ge
3d
5/2
29.32
Ge
32
Ge
SS-3d
5/2
-0.27
Ge
32
Ge
SS-3d
5/2
-0.75
Ge
32
Ge
SS-3d
5/2
0.23
Data Type:
Surface Core-level Shift
Line Designation:
SS-3d
5/2
Surface Core-Level Shift (eV):
-0.27
Energy Uncertainty:
0.03
Background Subtraction Method:
other
Peak Location Method:
mixed Gaussian/Lorentzian
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
0.35
Lorentzian Width (eV):
0.14
Use of X-ray Monochromator:
Yes
Anode Material:
other source
X-ray Energy:
70
Overall Energy Resolution (eV):
0.27
Calibration:
FL = Fermi level
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable (reported energy within 300 eV of a reference energy)
Comment:
n-type Sb-doped Ge(111)c(2x8) with a resistivity of 0.1 ohm cm. The sample was cleaned by cycles of Ar+ ion bombardment and annealing (T = 1100 K). Branching ratio = 0.581.
Specimen:
crystal, semiconductor, sputtered and heated
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Low-energy Electron Diffraction
Specimen Temperature (K):
300
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