NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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Ti

TiN

titanium nitride

CAS Registry No:

25583-20-4

nitride

Author Name(s):

Prieto P., Kirby R.E.

J. Vac. Sci. Technol. A 13, 2819

Pub Year:

1995

book All Records in this Publication

Photoelectron Line

Line Designation:

2p_3/2

Binding Energy (eV):

454.77

Energy Uncertainty:

0.05

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

1.10

Lorentzian Width (eV):

0.41

Use of X-ray Monochromator:

No

Anode Material:

Mg

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Ag3d5 = 368.27

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

The film with thickness of 140 A was prepared by direct sputtering from a TiN target. Emission angle = 15 degrees. FAT mode. Peak locations: Doniach - Sunjic & Gaussian. Asymmetry parameter = 0.32.

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