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NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
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General:
Citation
Data Processing:
Measurement:
Specimen:
Element:
Si
Formula:
C
2
H
4
/Si
XPS Formula:
SiC*
Name:
ethylene/silicon
CAS Registry No:
74-85-1
Class:
carbide, element, hydrocarbon
Author Name(s):
Stinespring C.D., Wormhoudt J.C.
Journal:
J. Appl. Phys. 65, 1733
DOI:
10.1063/1.342947
Pub Year:
1989
book
All Records in this Publication
Data Type:
Photoelectron Line
Line Designation:
2p
3/2
Binding Energy (eV):
100.70
Energy Uncertainty:
0.25
Background Subtraction Method:
Peak Location Method:
data
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
Calibration:
Au4f7 = 84.00
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
4E19 C2H4 cm-2/Si(111). It was shown that these exposures correspond to multilayer coverage.
Specimen:
adsorbed, multilayer
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
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