NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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Si

(^-Si(CH₃)₂^-C₆H₄^-Si(CH₃)₂^-O^-)x^-(Si(CH₃)₂^-O^-)y

poly(tetramethyl-p-silphenylenesiloxane)x-poly(dimethylsiloxane)y

CAS Registry No:

organometallic, oxygen, phenyl benzene, polymer

Author Name(s):

Schmitt R.L., Cardella J.A., Magill J.H., Chin R.L.

Polymer 28, 1462

Pub Year:

1987

book All Records in this Publication

Photoelectron Line

Line Designation:

2p, sat

Binding Energy (eV):

108.00

Energy Uncertainty:

0.2

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

No

Anode Material:

Mg

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Internal hydrocarbon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

The single crystal melt. x=80 and y=20 are weight %%. The binding energies of the C1s and O1s lines are the same as for the crystal poly(tetramethyl-p-silphenylenesiloxane).

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