NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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Si

Al₄N₄O₄Si₂

silicon nitride aluminum oxide aluminum nitride ss(Al4N4O4Si2)

CAS Registry No:

nitride, oxide, solid solution

Author Name(s):

Hagio T., Takase A., Umebayashi S.

J. Mater. Sci. Lett. 11, 878

Pub Year:

1992

book All Records in this Publication

Photoelectron Line

Line Designation:

2p

Binding Energy (eV):

101.70

Energy Uncertainty:

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

2.7

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

No

Anode Material:

Mg

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Charge Reference:

Argon

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

The sialon was obtained by hot-pressing mixtures in the system Si3N4 and Al2O3.AlN at 2073 K for 1 h at a pressure of 20 MPa under 1 atm N2. The sample was cleaned by Ar+ ion bombardment (Ep = 400 eV, time = 200 s). No Ar+ ion-induced damage to the sample

beta phase, heated and cooled, sputtered in argon

Method of Determining Specimen Composition:

Method of Determining Specimen Crystallinity:

Specimen Temperature (K):

300

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