NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

Details Summary:

One Page Summary

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Element:

C₆H₅SH/Ni

benzenethiol/nickel

108-98-5

carbide, element, phenyl benzene, sulfur, thiol

Author Name(s):

Huntley D.R.

Journal:

J. Phys. Chem. 96, 4550

DOI:

Pub Year:

1992

book All Records in this Publication

Photoelectron Line

162.50

Background Subtraction Method:

Peak Location Method:

data

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

Lorentzian Width (eV):

Use of X-ray Monochromator:

Anode Material:

X-ray Energy:

Overall Energy Resolution (eV):

Calibration:

Other, Ni3p3/2 = 66.08

Charge Reference:

Conductor

Energy Scale Evaluation:

Reliable, with one-point correction of energy scale

Comment:

0.16 ML (sulfur coverage) C6H5-SH/Ni(110). The substrate was cleaned by Ne+ ion bombardment and subsequently annealed (T = 1000 K, time = 60 s).

Specimen:

adsorbed, cooled, surface coverage from 0ML to 1ML (0ML < coverage < 1ML), thin layer

Method of Determining Specimen Composition:

Auger Electron Spectroscopy

Method of Determining Specimen Crystallinity:

Low-energy Electron Diffraction

Specimen Temperature (K):

100