NIST X-ray Photoelectron Spectroscopy Database

NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0

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Si

Mo₃Si

surface component

trimolybdenum silicide

CAS Registry No:

silicide

Doublet Separation for Photoelectron Lines

Line Designation:

DS-2p

Double Separation (eV):

0.61

Energy Uncertainty:

Background Subtraction Method:

other

Peak Location Method:

mixed Gaussian/Lorentzian

Full Width at Half-maximum Intensity (eV):

Gaussian Width (eV):

0.25

Lorentzian Width (eV):

0.10

Use of X-ray Monochromator:

Yes

Anode Material:

other source

X-ray Energy:

117

Overall Energy Resolution (eV):

0.2

Calibration:

Charge Reference:

Element

Energy Scale Evaluation:

Reliable (reported energy within 300 eV of a reference energy)

Comment:

Mo3Si(110)-(1x1) and Mo3Si(100)-(1x1). The samples were cleaned by Ar+ ion bombardment (Ep = 600 eV, Ip = 1 microampere, time = 5 min) followed by repeated annealings (T = ~1173 K (Mo3Si(100)) and T = ~973 K (Mo3Si(110)). Branching ratio = 0.50. Emission angle = 0 degree.

crystal, sputtered and heated

Method of Determining Specimen Composition:

Auger Electron Spectroscopy

Method of Determining Specimen Crystallinity:

Low-energy Electron Diffraction

Specimen Temperature (K):

300

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