There was a problem with the connection!
menu
NIST X-ray Photoelectron Spectroscopy Database (SRD 20), Version 5.0
Details Summary:
Summary Page
One Page Summary
Instruction:
Click on selected Tab for more information.
General:
Citation
Data Processing:
Measurement:
Specimen:
Element:
Si
Formula:
Si/SiO
2
XPS Formula:
SiO
2
/Si*
Name:
silicon/silicon dioxide
CAS Registry No:
7440-21-3
Class:
element, non-stoichiometric oxide
Author Name(s):
Behner H., Wecker J., Matthee T., Samwer K.
Journal:
Surf. Interface Anal. 18, 685
DOI:
10.1002/sia.740180909
Pub Year:
1992
book
All Records in this Publication
Data Type:
Photoelectron Line
Line Designation:
2p
Binding Energy (eV):
99.40
Energy Uncertainty:
Background Subtraction Method:
Linear
Peak Location Method:
Gaussian
Full Width at Half-maximum Intensity (eV):
Gaussian Width (eV):
Lorentzian Width (eV):
Use of X-ray Monochromator:
No
Anode Material:
Mg
X-ray Energy:
Overall Energy Resolution (eV):
0.9
Calibration:
Au4f7 = 84.00
Charge Reference:
Conductor
Energy Scale Evaluation:
Reliable, with one-point correction of energy scale
Comment:
17 A SiO2/p-type Si(100) with a resistivity of 1ohm cm. The thickness was measured by XPS.
Specimen:
semiconductor, wafer
Method of Determining Specimen Composition:
Method of Determining Specimen Crystallinity:
Specimen Temperature (K):
300
Go Back
Home
search
Identify Unknown Spectral Lines
search
Retrieve Data for Elements
keyboard_arrow_down
Selected Spectral Type and Element
Reference Data
search
Retrieve Data for Compounds
keyboard_arrow_down
Elemental Composition
Chemical Name
Chemical Classes
Data for One Element
assessment
Plots
keyboard_arrow_down
Wagner Plot
Chemical Shifts
search
Search Scientific Citations
assignment
More Options
keyboard_arrow_down
Introduction
Data Field Definitions
Citation
Contact
Version History
Acknowledgement
Disclaimer
An error has occurred. This application may no longer respond until reloaded.
Reload
🗙
